EPMA Sputter Depth Profiling: A New Technique for Quantitative in-Depth Analysis of Layered Structures
نویسندگان
چکیده
منابع مشابه
Glow Discharge Depth Profiling a Powerful Analytical Technique in Surface Engineering (TECHNICAL NOTE)
A variety of analytical techniques have been developed and employed to characterize the surfaces, subsurfaces and interfaces of surface engineering systems. They provide important information for quality control, process optimization and further development. Since the mid 1980's, glow discharge spectrometry (GDS) has emerged as an important and versatile technique for rapid depth profiling anal...
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We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of ≈5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure (24)Mg(+) and (64)Zn(+) intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a ...
متن کاملRetrospective sputter depth profiling using 3D mass spectral imaging.
A molecular multilayer stack composed of alternating Langmuir-Blodgett films was analyzed by ToF-SIMS imaging in combination with intermediate sputter erosion using a focused C60+ cluster ion beam. From the resulting dataset, depth profiles of any desired lateral portion of the analyzed field-of-view can be extracted in retrospect, allowing the influence of the gating area on the apparent depth...
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In-depth distribution of doping elements in shallow depth region is an important role of secondary ion mass spectrometry (SIMS) for the development of next-generation semiconductor devices. KRISS has developed two types of multi-layer reference materials by ion beam sputter deposition. A multiple delta-layer reference material where the layers of one element are very thin can be used to evaluat...
متن کاملThree-dimensional depth profiling of molecular structures.
Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging and cluster ion beam erosion are combined to perform a three-dimensional chemical analysis of molecular films. The resulting dataset allows a number of artifacts inherent in sputter depth profiling to be assessed. These artifacts arise from lateral inhomogeneities of either the erosion rate or the sample itself. Using a...
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ژورنال
عنوان ژورنال: Microscopy Microanalysis Microstructures
سال: 1995
ISSN: 1154-2799
DOI: 10.1051/mmm:1995132